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Elemental composition and electrical properties of (a-C:H):Cu films prepared by magnetron sputtering

✍ Scribed by T. K. Zvonareva; V. M. Lebedev; T. A. Polyanskaya; L. V. Sharonova; V. I. Ivanov-Omskii


Book ID
110124711
Publisher
Springer
Year
2000
Tongue
English
Weight
87 KB
Volume
34
Category
Article
ISSN
1063-7826

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp