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Electronic structure and thermochemistry of silicon hydride and silicon fluoride anions

โœ Scribed by H.H. Michels; R.H. Hobbs


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
670 KB
Volume
207
Category
Article
ISSN
0009-2614

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โœฆ Synopsis


An ab initio study of the electronic structure of SiH; and SiF; anions, and the corresponding neutral molecules, has been carried out using perturbation theory. Correlation energy treatments include both MP4 and QCISD methods. The anion thermochemistry is calculated through several isodesmic processes and compared with Pople's Gl and G2 method predictions. Good agreement with experimental electron aninities is found for the SiH; anions. Significant differences ( = IO kcal/mol) are found between theoretical and experimental heats of formation for SiF and SiFs. We find that all SiF; anions (n=O-3) are stable, with relative stabilities similar to that found for SiH;


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