Electronic structure and thermochemistry of silicon hydride and silicon fluoride anions
โ Scribed by H.H. Michels; R.H. Hobbs
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 670 KB
- Volume
- 207
- Category
- Article
- ISSN
- 0009-2614
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โฆ Synopsis
An ab initio study of the electronic structure of SiH; and SiF; anions, and the corresponding neutral molecules, has been carried out using perturbation theory. Correlation energy treatments include both MP4 and QCISD methods. The anion thermochemistry is calculated through several isodesmic processes and compared with Pople's Gl and G2 method predictions. Good agreement with experimental electron aninities is found for the SiH; anions. Significant differences ( = IO kcal/mol) are found between theoretical and experimental heats of formation for SiF and SiFs. We find that all SiF; anions (n=O-3) are stable, with relative stabilities similar to that found for SiH;
๐ SIMILAR VOLUMES
We developed an empirical potential for interactions between Si and N to describe silicon nitride systems using the Tersoff functional form. With this model, we explored the structural properties of amorphous silicon nitride through the Monte Carlo simulations and compared them to available experime