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Electronic states at SiSiO2 interface introduced by implantation of Si in thermal SiO2

✍ Scribed by A. Kalnitsky; A.R. Boothroyd; J.P. Ellul; E.H. Poindexter; P.J. Caplan


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
847 KB
Volume
33
Category
Article
ISSN
0038-1101

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