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Electron Trapping in 4H-SiC MOS Capacitors Fabricated by Sodium-Enhanced Oxidation

✍ Scribed by Basile, Alberto F.; Ahyi, A.C.; Feldman, L.C.; Williams, J.R.; Mooney, P.M.


Book ID
120509766
Publisher
Trans Tech Publications, Ltd.
Year
2012
Tongue
English
Weight
264 KB
Volume
717-720
Category
Article
ISSN
1662-9752

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MOS capacitors obtained by wet oxidation
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The manufacture process and the electrical characterization of MOS devices fabricated by wet oxidation of N + implanted n-type 4H-SiC are here presented. Different implantation fluence and energy values were used with the aims to study the effect of the N concentration both at the SiO 2 /SiC interfa