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Electron beam induced current (EBIC) as a function of the angle of incidence of the electron beam in a scanning electron microscope (SEM)

✍ Scribed by A. Jakubowicz

Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
308 KB
Volume
25
Category
Article
ISSN
0038-1101

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on