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Electron-beam assisted physical vapor deposition of polycrystalline silicon films

✍ Scribed by Sheba Jamil; Sanjeev K. Gupta; K. Anbalagan; J. Akhtar


Book ID
113810388
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
856 KB
Volume
14
Category
Article
ISSN
1369-8001

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Modeling of flame assisted chemical vapo
✍ M. Masi; C. Cavallotti; E. Raffa πŸ“‚ Article πŸ“… 2011 πŸ› John Wiley and Sons 🌐 English βš– 327 KB πŸ‘ 1 views

## Abstract The simulation of a flame assisted chemical vapor deposition (FACVD) process is here proposed with reference to the growth of silicon thin films through the silane/chlorosilanes/hydrogen/chlorine route. The goal is to design a reactor able to deposit micromorphous or multicrystalline fi