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Electron beam annealing for phosphorous and arsenic implantation

✍ Scribed by Lirong Zheng; Jin Chen


Book ID
113277348
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
445 KB
Volume
6
Category
Article
ISSN
0168-583X

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Pulsed electron-beam annealing of ion-im
πŸ“‚ Article πŸ“… 1980 πŸ› Elsevier Science 🌐 English βš– 162 KB

width of the energy distribution curve, ranging from about 50 to 15 eV FWHM, is found to depend on the applied voltage VA and the length-to-diameter ratio (+ of the channel, and to vary with output current. The results can be explained in terms of the normalized field strength near the output end of