Sublimation and diffusion of arsenic implanted into silicon at rapid electron beam annealing

✍ Scribed by R. Grötzschel; V.A. Kagadey; N.I. Lebedeva; D.I. Proskurovsky

• Book ID: 113282442
• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 281 KB
• Volume: 55
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(91)96233-b