๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films

โœ Scribed by Nayak, A. ;Banerjee, H. D.


Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
299 KB
Volume
151
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Plasma beam deposition of diamond-like f
โœ J Kessler; B Tomcik; J Waldorf; H Oechsner ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 441 KB
Filament-activated chemical vapour depos
โœ Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 987 KB

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun