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Electroless metallization of diamond films

โœ Scribed by Pimenov, S.M.; Shafeev, G.A.; Konov, V.I.; Loubnin, E.N.


Book ID
121295700
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
779 KB
Volume
5
Category
Article
ISSN
0925-9635

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It is shown that optimization of the electroless deposition and the use of vacuum annealing yield dramatic decrease in the resistivity and its scatter in 100-and 50-nm silver-tungsten (Ag-W) films. Physical processes, which control the resistivity drop during low-temperature annealing and the residu