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Electrochemical in situ conductivity measurements of C60 thin films

✍ Scribed by Matsuhiko Nishizawa; Tomokazu Matsue; Isamu Uchida


Publisher
Elsevier
Year
1993
Tongue
English
Weight
254 KB
Volume
353
Category
Article
ISSN
1572-6657

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## Abstract Metallic thin‐film plasticity has been widely studied by using the difference between the coefficients of thermal expansion of the film and the underlying substrate to induce stress. This approach is commonly known as the wafer curvature technique, based on the Stoney equation, which ha