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Electrocatalytic properties of ion-implanted oxide films

โœ Scribed by L. Elfenthal; T. Patzelt; J.W. Schultze; O. Meyer


Book ID
108025259
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
564 KB
Volume
116
Category
Article
ISSN
0921-5093

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Cobalt oxide films, fabricated by reactive sputtering m a 100% pure 0, plasma are highly nonstolchlometrlc with a bulk oxygen to cobalt ratlo of -1 15 Conversely, surface XPS studies mdlcate an oxygen to cobalt ratio rangmg from 1 8 to 3 0 and show the presence of Co3+ only m the surface reuon of th