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Photoelectrochemical properties of ion-implanted hafnium dioxide films

✍ Scribed by A.R. Newmark; U. Stimming

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 810 KB
Volume: 34
Category: Article
ISSN: 0013-4686
DOI: 10.1016/0013-4686(89)80008-8

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