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Electrical properties of undoped bulk ZnO substrates

✍ Scribed by A. Y. Polyakov; N. B. Smirnov; A. V. Govorkov; E. A. Kozhukhova; S. J. Pearton; D. P. Norton; A. Osinsky; Amir Dabiran

Book ID
107453627
Publisher
Springer US
Year
2006
Tongue
English
Weight
186 KB
Volume
35
Category
Article
ISSN
0361-5235

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ZnO films were grown on Si(100) and quartz substrates by inductively coupled plasma assisted chemical vapor deposition (ICP-CVD), using metal organic DEZ (diethlyzinc), and a gas mixture of Ar and O 2 . The process temperature ranged between room temperature and 400 Β°C. ZnO films showed both p-and n