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Electrical properties of silicon layers implanted with erbium and oxygen ions in a wide dose range and thermally treated in different temperature conditions

✍ Scribed by O. V. Aleksandrov; A. O. Zakhar’in; N. A. Sobolev; Yu. A. Nikolaev


Book ID
110129625
Publisher
Springer
Year
2002
Tongue
English
Weight
60 KB
Volume
36
Category
Article
ISSN
1063-7826

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