## Abstract High electron mobility transistor material and device properties based on Al~__x__~Ga~1โ__x__~N/GaN heterostructures with an Alโcontent ranging from 12 to 35% are presented. The Alโcontent of the low pressure metalโorganic vaporโphase epitaxy grown samples on semiโinsulating SiC and sap
โฆ LIBER โฆ
Electrical properties of AlxGa1-xN/GaN heterostructures with low Al content
โ Scribed by Kohler, K.; Muller, S.; Waltereit, P.; Pletschen, W.; Polyakov, V.; Lim, T.; Kirste, L.; Menner, H. P.; Bruckner, P.; Ambacher, O.; Buchheim, C.; Goldhahn, R.
- Book ID
- 111682908
- Publisher
- American Institute of Physics
- Year
- 2011
- Tongue
- English
- Weight
- 465 KB
- Volume
- 109
- Category
- Article
- ISSN
- 0021-8979
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