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Electrical, optical, and structural characteristics of ohmic contacts betweenp-GaN and ITO deposited by DC- and RF-magnetron sputtering

โœ Scribed by Jun-Hyuk Choi, Seon-Ho Jang, Ja-Soon Jang

Book ID
120723255
Publisher
The Korean Institute of Metals and Materials
Year
2013
Tongue
English
Weight
434 KB
Volume
9
Category
Article
ISSN
1738-8090

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โœ Ying Zhou; Donghong Gu; Yongyou Geng; Fuxi Gan ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 330 KB

The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos