Electrical, optical and luminescent properties of Si3N4 films containing Si nanoclusters
โ Scribed by V.G. Baru; S. Bayliss; A.P. Chernushich; M.I. Elinson; P. Harris; V.A. Jitov; V.I. Pokalyakin; G.V. Stepanov; L.Yu. Zaharov
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 225 KB
- Volume
- 36
- Category
- Article
- ISSN
- 0167-9317
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โฆ Synopsis
Visible photoand electroluminesceuce was found at room temperature in two types of nanocomposite layers SiNx(Si). The first type of layers was obtained by annealing a-Si film.g in nitrogen at 900-950ยฐC. The second type of layers was obtained by ion-plasma reactive sputtering of a Si target in a nitrogen atmosphere. The photo-and eleetrolnminesceuce spectral response, optical transmission and voltage-current characteristics of the SiNx nanocomposite layers have been studied. Structural information has been obtained from electron microscopy. Possible physical mechanisms for the observed effects are disc~sse~
๐ SIMILAR VOLUMES
Silicon nitride layers of 140 nm thickness were deposited on silicon wafers by low pressure chemical vapour deposition (LPCVD) and irradiated at GANIL with Pb ions of 110 MeV up to a maximum fluence of 4 ร 10 13 cm ร2 . As shown in a previous work these irradiation conditions, characterized by a pre