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Bulk and surface properties of RTCVD Si3N4 films for optical device applications

✍ Scribed by F. Lebland; Z.Z. Wang; J. Flicstein; C. Licoppe; Y.I. Nissim

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 565 KB
Volume: 69
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(93)90504-5

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