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Electrical conduction in silicon monoxide films

✍ Scribed by A.E. Hill; A.M. Phahle; J.H. Calderwood

Book ID
107859806
Publisher
Elsevier Science
Year
1970
Tongue
English
Weight
356 KB
Volume
5
Category
Article
ISSN
0040-6090

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Titanium monoxide films of about 100 mm thickness have been deposited onto Si (100) by reactive ion beam deposition. The established experimental conditions provided reproducibility of synthesised films. With a fcc cubic structure and a lattice parameter of 4.17 A ˚, as found by X-ray diffraction ;