Generation of droplet-free high-power pu
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Yukimura, K. ;Mieda, R. ;Tamagaki, H. ;Okimoto, T.
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Article
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2008
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John Wiley and Sons
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English
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## Abstract A droplet free metallic plasma source is promising for enhanced adhesion of films with a smooth coating surface. This paper concerns a highly ionized metallic plasma source using a pulsed Penning discharge. A highβpower pulsed sputtering (HPPS) glow discharge plasma is generated using e