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Efficient improvement of hot carrier-induced degradation for 0.1-μm indium-halo nMOSFET

✍ Scribed by Wen-Kuan Yeh; Jung-Chun Lin


Book ID
114617370
Publisher
IEEE
Year
2004
Tongue
English
Weight
222 KB
Volume
51
Category
Article
ISSN
0018-9383

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Hot-carrier-induced abnormal gm degradat
✍ Yasuhisa Omura 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 771 KB

This paper describes hot-carrier-induced, abnormal g degradation in 0.04-mm-channel nMOSFETs / SIMOX, which is not m easily predicted, and its physical background. The discussion includes device simulations showing that the LDS / LDD structure plays a significant role in the abnormal g degradation.