Hot-carrier-induced abnormal gm degradat
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Yasuhisa Omura
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Article
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1999
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Elsevier Science
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English
⚖ 771 KB
This paper describes hot-carrier-induced, abnormal g degradation in 0.04-mm-channel nMOSFETs / SIMOX, which is not m easily predicted, and its physical background. The discussion includes device simulations showing that the LDS / LDD structure plays a significant role in the abnormal g degradation.