Effect of AlN film thickness on photo/da
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Ru-Yuan Yang; Chin-Min Hsiung; Hsuan-Hsu Chen; Hung-Wei Wu; Ming-Chang Shih
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Article
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2008
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John Wiley and Sons
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English
β 378 KB
## Abstract In this article, we have successfully fabricated the metalβsemiβconductorβmetal (MSM) UV photodetector using the aluminum nitrideβbased (AlN) film as an active layer grown on pβtype Si (100) by a dc sputtering deposition. Effect of AlN thickness of 500, 1500, and 2500 nm on the surface