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Effects of Surface Pretreatments of a Glass Substrate on the Properties of Tin Oxide Film Prepared by Vacuum Deposition

✍ Scribed by Masahiko Arai; Satoshi Hamada; Yoshiyuki Nishiyama


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
292 KB
Volume
179
Category
Article
ISSN
0021-9797

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✦ Synopsis


NOTE

Effects of Surface Pretreatments of a Glass Substrate on the Properties of Tin Oxide Film Prepared by Vacuum Deposition nitrate at 400ЊC for 4 h with a crucible in air. These treatments will be abbreviated by H-, F-, and K-treatment, respectively.

A glass substrate was pretreated by thermal and chemical treat-

oxide film was prepared by VD from metallic tin. Tin was vacuum ments with fluoride solution and molten potassium salt. Thin tin deposited with a tungsten spiral heating wire under a back pressure of about oxide film was prepared on it by vacuum deposition of metallic 0.01 Pa. The glass substrate was supported on an electrical heating plate tin followed by oxidation with air. The sheet resistivity of tin oxide and kept at the desired temperature. The temperature was measured by a film deposited was found to decrease by the pretreatment with thermocouple attached to the surface of the substrate. The tin film deposited fluoride. The film was composed of round particles that closely was then oxidized by air at 500ЊC to obtain transparent tin oxide film. coalesced with each other and the sizes of them were affected

The sheet resistances of the films prepared were measured by a two-probe by the pretreatment of substrate, resulting in the change of the method using peripheral surface electrodes in an air-conditioned room. The electroconductivity. The effects of the pretreatments were comsheet resistivity was obtained from a predetermined relationship between pared with previous results on the same pretreatments for tin oxide the resistivity measured by the two-probe method and that with two parallel electrodes. The refraction index was determined by the Abele `s method (11) film prepared by chemical vapor deposition.


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