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Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma

โœ Scribed by Lee, Hyo-Chang; Lee, Min-Hyong; Chung, Chin-Wook


Book ID
127244678
Publisher
American Institute of Physics
Year
2010
Tongue
English
Weight
376 KB
Volume
96
Category
Article
ISSN
0003-6951

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