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Effects of rapid, high-dose, elevated temperature ion implantation on the microstructure and tribology of ferrous surfaces

โœ Scribed by D.L. Williamson; R. Wei; P.J. Wilbur


Book ID
113282332
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
550 KB
Volume
56-57
Category
Article
ISSN
0168-583X

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The effect of implantation temperature and oxygen dose on the structure of as-implanted separation by implantation of oxygen (SIMOX) wafers was studied by means of Rutherford backscattering spectrometry and ion channelling, secondary ion mass spectrometry and cross-sectional transmission electron mi