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Effects of plasma non-homogeneity on the physical properties of sputtered thin films

โœ Scribed by V Rigato; G Maggioni; A Patelli; V Antoni; G Serianni; M Spolaore; L Tramontin; L Depero; E Bontempi

Book ID
108422915
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
150 KB
Volume
142-144
Category
Article
ISSN
0257-8972

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Physical properties of reactive sputtere
Physical properties of reactive sputtered tin-nitride thin films
โœ Y Inoue; M Nomiya; O Takai ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 302 KB

We report on the physical properties of tin-nitride thin films deposited onto glass substrates by rf reactive sputtering. The crystal structure of the tin-nitride films is hexagonal and the lattice parameters are calculated from X-ray diffraction patterns as a = 0.369 nm and c = 0.529 nm. X-ray phot