Hafnium dioxide (HfO 2 ) thin films were deposited on a quartz substrate by RF reactive magnetron sputtering. The influence of O 2 /Ar flow ratio on the deposition rate, structure and optical properties of HfO 2 thin films were systematically studied using X-ray diffraction (XRD), scan electron micr
Effects of O2/Ar flow ratio on the alcohol sensitivity of tin oxide film
β Scribed by Hsiao-Ching Lee; Weng-Sing Hwang; Gwo-Bin Lee; Yang-Ming Lu
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 587 KB
- Volume
- 252
- Category
- Article
- ISSN
- 0169-4332
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