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Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method

✍ Scribed by Hong Tak Kim, Jun Young Park, Chinho Park


Book ID
113090768
Publisher
Springer US
Year
2012
Tongue
English
Weight
503 KB
Volume
29
Category
Article
ISSN
0256-1115

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Titanium oxynitride (TiN x O y ) films have been deposited onto polyethylene terephthalate (PET) substrates by reactive radio frequency (RF) magnetron sputtering. The influence of the nitrogen (N 2 ) partial pressure in the discharge atmosphere, with a set pressure of 0.133 Pa, was examined. Other d