𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effects of Low Temperature Annealing of B+ + Si+ OR BF2+ + Si+ Implanted Silicon

✍ Scribed by Wilson, S. R.; Gregory, R. B.; Paulson, W. M.; Hamdi, A. H.; McDaniel, F. D.

Book ID
114662765
Publisher
IEEE
Year
1983
Tongue
English
Weight
578 KB
Volume
30
Category
Article
ISSN
0018-9499

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Excimer laser annealing of B and BF2 imp
Excimer laser annealing of B and BF2 implanted Si
✍ E.V. Monakhov; B.G. Svensson; M.K. Linnarsson; A. La Magna; M. Italia; V. Privit πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 207 KB
Surface morphologies of excimer-laser an
Surface morphologies of excimer-laser annealed BF2+ implanted Si diodes
✍ A. Burtsev; H. Schut; L.K. Nanver; A. van Veen; J. Slabbekoorn; T.L.M. Scholtes πŸ“‚ Article πŸ“… 2004 πŸ› Elsevier Science 🌐 English βš– 186 KB

Laser-induced surface roughness and damage formation in ultra-shallow n + -p and p + -n junctions, formed by low energy (5 keV) As + and BF 2 + implantations in Si, respectively, with a dose of 1 Γ— 10 15 cm -2 have been investigated by atomic force microscopy (AFM) and Positron Annihilation Doppler