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Effects of ion implantation on the annealing behaviour of amorphous germanium and gold bilayers

✍ Scribed by Hou Jian-Guo; Wu Zi-Qin; Bi Ling-Song

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
391 KB
Volume
173
Category
Article
ISSN
0040-6090

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## Abstract The realtime evolution of stress during deposition of Cu/Au and Au/Cu bilayers was studied by an in‐situ curvature measurement optical technique and annealing in the temperature range from room temperature to 400 Β°C. The Au/Cu and Cu/Au bilayers attached to silicon substrate with total