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Effects of discharge current and substrate temperature on the microstructure of diamond films deposited by DC plasma CVD

✍ Scribed by Setsuo Nakao; Hirohumi Watatani; Shigeo Maruno; Mikio Noda

Book ID
107790811
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
382 KB
Volume
115
Category
Article
ISSN
0022-0248

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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea