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Effects of deposition temperature on the properties of hydrogenated tetrahedral amorphous carbon

✍ Scribed by Sattel, S.; Robertson, J.; Ehrhardt, H.

Book ID
111653453
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
511 KB
Volume
82
Category
Article
ISSN
0021-8979

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Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character