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Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition

✍ Scribed by Rusop, M.; Omer, A.M.M.; Adhikari, S.; Adhikary, S.; Uchida, H.; Soga, T.; Jimbo, T.; Umeno, M.

No coin nor oath required. For personal study only.

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