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Effects of As+-implantation on the formation of iron silicides in Fe thin films on (1 1 1)Si

✍ Scribed by H.T Lu; Y.L Chueh; L.J Chou; L.J Chen


Book ID
118569360
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
242 KB
Volume
212-213
Category
Article
ISSN
0169-4332

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Effects of stress on the formation and growth of nickel silicides in Ni thin films on (0 0 1)Si have been investigated. Compressive stress induced by backside SiO 2 film on the silicon substrate was found to retard significantly the formation of Ni 2 Si, NiSi and NiSi 2 on (0 0 1)Si. On the other ha