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Effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin films

โœ Scribed by YongHwa Chris Cha; Guho Kim; Hans J. Doerr; Rointan F. Bunshah

Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
552 KB
Volume
253
Category
Article
ISSN
0040-6090

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