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Effect of underlying silicon film on the evolution of microstructure and hardness of the high-temperature annealed carbon film on Si substrate

✍ Scribed by C.K. Chung; B.H. Wu


Book ID
113793103
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
591 KB
Volume
63
Category
Article
ISSN
0167-577X

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Nanocrystalline silicon carbide (nc-SiC) thin films have been grown on silicon (1 0 0) substrates by helicon wave plasma enhanced chemical vapor deposition technique and the photoluminescence of the films has been tuned from yellow to blue by changing the substrate temperatures (T s ). The resulting