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Effect of total gas pressure and O2/N2 flow rate on the nanostructure of N-doped TiO2 thin films deposited by reactive sputtering

✍ Scribed by Baker, M.A.; Fakhouri, H.; Grilli, R.; Pulpytel, J.; Smith, W.; Arefi-Khonsari, F.

No coin nor oath required. For personal study only.

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