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Effect of thermal fluctuations on the stability of draining thin films

✍ Scribed by Tsekov, Roumen; Ruckenstein, Eli


Book ID
126394163
Publisher
American Chemical Society
Year
1993
Tongue
English
Weight
657 KB
Volume
9
Category
Article
ISSN
0743-7463

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Thermal stability of amorphous Ti3Si1O8
✍ P.H. Giauque; H.B. Cherry; M.-A. Nicolet πŸ“‚ Article πŸ“… 2001 πŸ› Elsevier Science 🌐 English βš– 137 KB

Films (220 nm-thick) deposited by reactive rf sputtering from a Ti Si target with an argon / oxygen gas mixture were 3 21 annealed for 30 min in vacuum at temperatures between 400 and 9008C. The films were characterized by 2 MeV He backscattering spectrometry and X-ray diffraction to monitor thermal