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Effect of thermal annealing on the optical properties of high-energy Cu-implanted silica glass

✍ Scribed by U Pal; A Bautista-Hernández; L Rodrı́guez-Fernández; J.C Cheang-Wong

Book ID
117144616
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
175 KB
Volume
275
Category
Article
ISSN
0022-3093

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Silicon capped by thermal oxide has been implanted with 1 • 10 17 H/cm 2 and the implant profile peaking at the interface. Samples were subjected to thermal annealing and characterized by ERD, FTIR, RBS/channeling, UV/VIS reflectance and cathodoluminescence regarding H-content, crystalline quality a