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Effect of thermal annealing on the microstructural and electrical properties of Al-doped ZnO thin films grown on n-Si (1 0 0) substrates

✍ Scribed by J.H. Han; Y.S. No; J.Y. Lee; T.W. Kim; J.Y. Kim; W.K. Choi

No coin nor oath required. For personal study only.

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Effect of thermal annealing on the microstructural and electrical properties of Al-doped ZnO thin films grown on n-Si (1&#xa0;0&#xa0;0) substrates