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Effect of temperature on the evolution of diffusivity, microstructure and hardness of nanocrystalline nickel films electrodeposited at low temperatures

โœ Scribed by C.K. Chung; W.T. Chang; C.F. Chen; M.W. Liao


Book ID
113794065
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
452 KB
Volume
65
Category
Article
ISSN
0167-577X

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Nanocrystalline silicon carbide (nc-SiC) thin films have been grown on silicon (1 0 0) substrates by helicon wave plasma enhanced chemical vapor deposition technique and the photoluminescence of the films has been tuned from yellow to blue by changing the substrate temperatures (T s ). The resulting