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Effect of substrate material on the structure of carbon films obtained by plasmachemical deposition

✍ Scribed by A. V. Tyurnina; A. A. Zolotukhin; A. N. Obraztsov


Book ID
111449512
Publisher
SP MAIK Nauka/Interperiodica
Year
2006
Tongue
English
Weight
195 KB
Volume
32
Category
Article
ISSN
1063-7850

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## Abstract When carbon films are prepared using thermal CVD, the properties of carbon films are affected by many factors, such as the precursor gas, deposition temperature, and working pressure. It is believed that the substrate size is also an important factor in preparing carbon films by thermal