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Effect of Si interlayer thickness and post-metallization annealing on Ge MOS capacitor on Ge-on-Si substrate

✍ Scribed by Ook Sang Yoo; Jungwoo Oh; Chang Yong Kang; Byoung Hun Lee; In Shik Han; Won-Ho Choi; Hyuk-Min Kwon; Min-Ki Na; Prashant Majhi; Hsing-Huang Tseng; Raj Jammy; Jin Suk Wang; Hi-Deok Lee


Book ID
108215581
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
710 KB
Volume
154-155
Category
Article
ISSN
0921-5107

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