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Effect of Reduced Pressure on 3C-SiC Heteroepitaxial Growth on Si by CVD

✍ Scribed by Y. Ishida; T. Takahashi; H. Okumura; K. Arai; S. Yoshida


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Volume
12
Category
Article
ISSN
0948-1907

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CVD Growth of 3C-SiC on 4H/6H Mesas
✍ P. G. Neudeck; A. J. Trunek; D. J. Spry; J. A. Powell; H. Du; M. Skowronski; X.  πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English

## Abstract This article describes growth and characterization of the highest quality reproducible 3C‐SiC heteroepitaxial films ever reported. By properly nucleating 3C‐SiC growth on top of perfectly on‐axis (0001) 4H‐SiC mesa surfaces completely free of atomic scale steps and extended defects, gro