CVD Growth of 3C-SiC on 4H/6H Mesas
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P.βG. Neudeck; A.βJ. Trunek; D.βJ. Spry; J.βA. Powell; H. Du; M. Skowronski; X.β
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Article
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2006
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John Wiley and Sons
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English
## Abstract This article describes growth and characterization of the highest quality reproducible 3CβSiC heteroepitaxial films ever reported. By properly nucleating 3CβSiC growth on top of perfectly onβaxis (0001) 4HβSiC mesa surfaces completely free of atomic scale steps and extended defects, gro