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Effect of plasma imperfections on the divergence and emittance of the beam extracted from duoplasmatron sources

✍ Scribed by J Aubert; C Lejeune

Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
526 KB
Volume
34
Category
Article
ISSN
0042-207X

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Oxygen ions with energy in the range 4-15 keV O' were used to synthesize surface oxide layers by bombarding Si samples at di †erent angles of incidence with respect to the surface normal. High-resolution Rutherford backscattering spectroscopy and channelling were used to determine both the stoichiom