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The brightness and emittance of negative ion beams from a middleton source, part II

✍ Scribed by G. Doucas; H.R. Mck. Hyder; A.B. Knox


Publisher
Elsevier Science
Year
1975
Weight
842 KB
Volume
124
Category
Article
ISSN
0029-554X

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Oxygen ions with energy in the range 4-15 keV O' were used to synthesize surface oxide layers by bombarding Si samples at di †erent angles of incidence with respect to the surface normal. High-resolution Rutherford backscattering spectroscopy and channelling were used to determine both the stoichiom