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Effect of Oxidant on Downstream Microwave Plasma-Enhanced CVD of Hafnium Oxynitride Films

✍ Scribed by Q. Luo; D. W. Hess; W. S. Rees Jr.

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
310 KB
Volume
12
Category
Article
ISSN
0948-1907

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