Effect of negative substrate bias on the microstructure and mechanical properties of Ti–Si–N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique

✍ Scribed by Yujuan Zhang; Yingze Yang; Yuhao Zhai; Pingyu Zhang

• Book ID: 116245202
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 930 KB
• Volume: 258
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2012.03.127