Effect of near-substrate plasma density in the reactive magnetron sputter deposition of hydrogenated amorphous germanium

✍ Scribed by Tobin Kaufman-Osborn; Kristin M. Pollock; Jonas Hiltrop; Kyle Braam; Steven Fazzio; James R. Doyle

• Book ID: 113937268
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 883 KB
• Volume: 520
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2011.09.018